ʻO ka sensor kaomi kiʻekiʻe YN52S00027P1 kūpono no SK200-6 excavator o Shengang
◆ No nā mea i hoʻohana ʻia i loko o nā puʻupuʻu kiʻekiʻe kiʻekiʻe, hoʻohana pinepine ʻia ka mālama ʻana i ka wela a me ka paʻakikī o ka ʻili e hoʻomaikaʻi i kā lākou extrusion kū'ē a me ka erosion.
1, hoʻomaʻamaʻa wela wela
ʻO ka hoʻomaʻamaʻa wela wela e pili ana i ke kaʻina hana wela kahi i waiho ʻia ai ka mea hana i loko o ka ʻōpala. ʻAʻole hana ka hoʻomaʻemaʻe wela i ka oxidation, decarburization a me nā corrosion ʻē aʻe i ka wā o ka hoʻomehana ʻana, akā loaʻa nō hoʻi ka hana o ka hoʻomaʻemaʻe ʻana i ka ʻili, degreasing a degreasing. Hiki ke hoʻoneʻe ʻia ka hydrogen, nitrogen a me ka oxygen e ka mea i ka wā o ka hoʻoheheʻe ʻana i loko o ka vacuum, a hiki ke hoʻomaikaʻi ʻia ka maikaʻi a me ka hana o ka mea. No ka laʻana, ma hope o ka hoʻomaʻamaʻa ʻana i ka wela wela o ka ʻili kiʻekiʻe kiʻekiʻe kiʻekiʻe i hana ʻia e W18Cr4V, ua hoʻonui maikaʻi ʻia ka makemake o ka valve needle, a i ka manawa like, hoʻomaikaʻi ʻia nā waiwai mechanical a me ke ola lawelawe.
2. Lapaʻau hoʻoikaika kino
I mea e hoʻomaikaʻi ai i ka hana o nā ʻāpana, ma kahi o ka hoʻololi ʻana i ka mea, ua hoʻohana ʻia nā ʻano hana lapaʻau e hoʻoikaika i ka ʻili. E like me ka hoʻopau ʻana i ka ili (ka wela wela, ka hoʻoheheʻe ʻana i ka ili kiʻekiʻe a me ka waena, ka hoʻopili ʻana i ka hoʻoheheʻe ʻana i ka ili uila, ka hoʻoheheʻe ʻana o ka ili electrolyte, ka hoʻoheheʻe ʻana i ka ʻili uila uila, a me nā mea ʻē aʻe), carburizing, nitriding, cyaniding, boronizing (TD method), ka hoʻoikaika ʻana i ka laser, ka hoʻoheheʻe ʻana i ka mahu (CVD method), ka hoʻoheheʻe ʻana i ka mahu kino (ke ʻano PVD), ka hoʻoheheʻe ʻana o ka mahu kemika plasma (ke ʻano PCVD) ka hoʻoulu ʻana i ka plasma, etc.
Ka waiho mahu kino (PVD ano)
I loko o ka vacuum, hoʻohana ʻia nā ʻano kino e like me ka evaporation, ka ion plating a me ka sputtering e hana i nā ion metala. Hoʻokomo ʻia kēia mau ion metala ma luna o ka ʻili o ka mea hana e hana i kahi uhi metala, a i ʻole e hana me ka reactor e hana i kahi uhi hui. Kapa ʻia kēia kaʻina hana lapaʻau he physical vapor deposition, a i ʻole PVD no ka pōkole. Loaʻa i kēia ʻano ka maikaʻi o ka haʻahaʻa haʻahaʻa haʻahaʻa, 400 ~ 600 ℃ ka mahana mālama, liʻiliʻi deformation a me ka liʻiliʻi o ka hopena i ka hoʻolālā matrix a me nā waiwai o nā ʻāpana. Ua waiho ʻia kahi ʻāpana TiN ma luna o ka valve nila i hana ʻia me W18Cr4V ma ke ʻano PVD. He kiʻekiʻe loa ka paʻakikī o ka papa TiN (2500~3000HV) a me ke kūpaʻa ʻaʻahu kiʻekiʻe, e hoʻomaikaʻi ai i ka pale ʻana i ka corrosion o ka valve, ʻaʻole i ʻino i ka waika hydrochloric dilute, sulfuric acid a me nitric acid, a hiki ke mālama i kahi ʻālohilohi. Ma hope o ka mālama ʻana i ka PVD, ʻoi aku ka pololei o ka uhi. Hiki iā ia ke lepo a poni ʻia, a ʻo Ra0.8µm kona ʻili ʻili, hiki ke hiki i 0.01µm ma hope o ka poli.